Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Electron beam imaging
Patent
1980-12-04
1982-03-16
Martin, Jr., Roland E.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Electron beam imaging
430314, 430319, 430952, 156654, 1566591, G03C 500, B44C 122
Patent
active
043201903
ABSTRACT:
The invention provides a method of manufacturing the substrate of an electrochromic display cell as a result of which the ionic conductor of the cell cannot come into contact with the transparent conductive elements which form part of this substrate. A transparent conductive layer, a layer of an electrochromic material and a layer of photosensitive material having a positive action are deposited in turn on a transparent plate. A network of conductive elements is formed by etching away the electrochromic layer and the conductive layer through a mask constituted by the photosensitive material which is selectively exposed and developed. The electrochromic material is then etched away through a second mask formed by the same photosensitive material selectively exposed and developed a second time. This second mask is also used for the deposition of a layer of dielectric material. The conductive elements are thus covered with a continuous layer of dielectric material and of electrochromic material.
REFERENCES:
patent: 3506442 (1970-04-01), Kerwin
patent: 3784380 (1974-01-01), Compare
patent: 3858304 (1975-01-01), Leedy et al.
patent: 3860424 (1975-01-01), Johnson
patent: 4040891 (1977-08-01), Chang et al.
Ebauches S.A.
Martin Jr. Roland E.
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