Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Patent
1989-12-12
1991-04-02
Robinson, Ellis P.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
430 30, 430299, 430313, 430321, 430323, 430326, 430327, 430329, 35016221, 35016222, 35016223, 35016224, 427 38, 156643, 1566591, G03C 500, B44C 100, G02B 518
Patent
active
050046730
ABSTRACT:
A method of manufacturing surface relief patterns of variable depth in solid materials is disclosed, which patterns, when seen in cross-section, are of variable geometry. After determining the properties of the desired surface relief pattern and of the material to be etched, the steps used in the method include: depositing a layer of measured thickness of photoresist material on the surface of the material to be etched; applying a selected amount of radiation to specific areas on the photoresist, thereby sensitizing the photoresist, so that the amount of radiation on the photoresist is a function of the depth of the desired surface relief pattern in the solid material at that point; chemically developing the photoresist material to remove the sensitized material in proportion to the exposure which it has received; and finally, etching the combined photoresist and substrate through reactive ion etching until portions of the photoresist material have been removed, thereby leaving the desired pattern etched in the substrate. As an additional step, the etched substrate may be coated with a metallic film with protective and optically desirable properties.
REFERENCES:
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patent: 4530736 (1985-07-01), Mutter
T. Fujita, H. Nishihara and J. Koyama, "Blazed Gratings and Fresnel Lenses Fabricated by Electron-Beam Lithography", vol. 7, No. 12, pp. 578-580, Dec. 1982.
T. Shiono, K. Setsune, O. Yamazaki, and K. Wasa, "Computer-Controlled Electron-Beam Writing Systsem for Thin Micro-Optics", Journal of Vacuum Science and Technology B, vol. 5, No. 1, pp. 33-36, Jan./Feb. 1987.
T. Shiono, K. Setsune, O. Yamazaki, and K. Wasa, "Rectangular-Apertured Micro-Fresnel Lens Array Fabricated by Electron-Beam Lithography", Applied Optics, vol. 26, No. 3, pp. 587-591, Feb. 1, 1987.
Environmental research Institute of Michigan
Loney Donald J.
Robinson Ellis P.
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