Method of manufacturing semiconductor device

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate

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Details

438769, 438775, 438786, 438791, H01L 2131

Patent

active

060604034

ABSTRACT:
A method of manufacturing a semiconductor device comprises the step of applying a nitridation treatment to a semiconductor substrate in the presence of a network terminal element so as to form a nitride film containing the network terminal element on the semiconductor substrate.

REFERENCES:
patent: 3373051 (1968-03-01), Chu et al.
patent: 3421936 (1969-01-01), Vogel
patent: 4435447 (1984-03-01), Ito et al.
patent: 5731235 (1998-03-01), Srinivasan et al.
patent: 5891789 (1999-04-01), Lee

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