Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
Patent
1998-09-16
2000-05-09
Niebling, John F.
Semiconductor device manufacturing: process
Coating of substrate containing semiconductor region or of...
By reaction with substrate
438769, 438775, 438786, 438791, H01L 2131
Patent
active
060604034
ABSTRACT:
A method of manufacturing a semiconductor device comprises the step of applying a nitridation treatment to a semiconductor substrate in the presence of a network terminal element so as to form a nitride film containing the network terminal element on the semiconductor substrate.
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patent: 3421936 (1969-01-01), Vogel
patent: 4435447 (1984-03-01), Ito et al.
patent: 5731235 (1998-03-01), Srinivasan et al.
patent: 5891789 (1999-04-01), Lee
Koike Masahiro
Muraoka Kouichi
Satake Hideki
Yasuda Naoki
Jones Josetta
Kabushiki Kaisha Toshiba
Niebling John F.
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