Method of manufacturing monocrystalline silicon micromirrors

Details Method of manufacturing monocrystalline silicon micromirrors Method of manufacturing monocrystalline silicon micromirrors

2011-07-19

2011-07-19

Consilvio, Mark (Department: 2872)

Etching a substrate: processes

Etching of semiconductor material to produce an article...

C216S079000, C216S099000, C438S029000, C438S770000, C438S791000

Reexamination Certificate

active

07981303

ABSTRACT:
A novel silicon micromirror structure for improving image fidelity in laser pattern generators is presented. In some embodiments, the micromirror is formed from monocrystalline silicon. Analytical- and finite element analysis of the structure as well as an outline of a fabrication scheme to realize the structure are given. The spring constant of the micromirror structure can be designed independently of the stiffness of the mirror-surface. This makes it possible to design a mirror with very good planarity, resistance to sagging during actuation, and it reduces influence from stress in reflectivity-increasing multilayer coatings.

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