Method of manufacturing microelectronic devices having multifunc

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface

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430271, 430313, 156643, G03F 711

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active

054016134

ABSTRACT:
A photolithographic composition having improved processability and which eliminates the need for interlayering multiple special purpose coatings in the production of microelectronic devices is surprisingly made possible by selective dissolution of a polymer and an effective light attenuating material in critical solvents. The polymers which are used in the present invention include homopolymers and copolymers of poly(vinylpyridine).

REFERENCES:
patent: 4822718 (1989-04-01), Latham
patent: 5234990 (1993-08-01), Flaim

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