Method of manufacturing a thin film transistor substrate and...

Details Method of manufacturing a thin film transistor substrate and... Method of manufacturing a thin film transistor substrate and...

2007-11-27

2007-11-27

Nhu, David (Department: 2818)

Semiconductor device manufacturing: process

Making field effect device having pair of active regions...

On insulating substrate or layer

C438S197000, C438S706000, C438S733000, C438S745000, C257SE21051, C257SE21229, C257SE21245

Reexamination Certificate

active

11215140

ABSTRACT:
A method of manufacturing a thin film transistor substrate includes forming a transistor thin layer pattern, forming a protecting layer, forming a photoresist film, forming a pixel electrode and a conductive layer that are separated from each other, stripping a photoresist pattern to remove the conductive layer using a stripping composition and dissolving the conductive layer. The method of manufacturing a thin film transistor substrate is capable of improving an efficiency of manufacturing process of the thin film transistor substrate. In addition, the stripping composition is recycled.

REFERENCES:
patent: 5986729 (1999-11-01), Yamanaka et al.
patent: 6924865 (2005-08-01), Ohta et al.
patent: 7042545 (2006-05-01), Byun et al.
patent: 2005/0078233 (2005-04-01), Lim et al.
patent: 2006/0269849 (2006-11-01), Lee
patent: 2007/0020910 (2007-01-01), Park et al.
patent: 2007/0082432 (2007-04-01), Lee

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