Method of manufacturing a thin film transistor array panel...

Details Method of manufacturing a thin film transistor array panel... Method of manufacturing a thin film transistor array panel...

2006-01-13

2009-06-02

Smoot, Stephen W (Department: 2813)

Semiconductor device manufacturing: process

Making field effect device having pair of active regions...

On insulating substrate or layer

C438S158000, C438S633000, C257SE21700

Reexamination Certificate

active

07541225

ABSTRACT:
A method of manufacturing a thin film transistor array panel is provided, the method including forming a thin film transistor having a gate electrode, a source electrode, and a drain electrode on a substrate, forming a passivation layer on the source electrode and the drain electrode, forming a photoresist film on the passivation layer, selectively etching the passivation layer using the photoresist film as a mask, forming a conductive film, and removing the photoresist film along with the conductive film disposed on the photoresist film using a CMP (chemical mechanical polishing) process to form a pixel electrode being connected to the drain electrode.

REFERENCES:
patent: 5780326 (1998-07-01), Dennison et al.
patent: 7056834 (2006-06-01), Mei et al.
patent: 7145613 (2006-12-01), Zhang et al.
patent: 2004/0229466 (2004-11-01), Ishikawa et al.

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