Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma
Reexamination Certificate
2011-01-25
2011-01-25
Chen, Bret (Department: 1715)
Coating processes
Direct application of electrical, magnetic, wave, or...
Plasma
C427S249700, C427S249140, C427S255700, C427S166000
Reexamination Certificate
active
07875323
ABSTRACT:
In a method of manufacturing a substrate and a method of manufacturing a liquid crystal display panel, a conductive is formed on a base substrate, and a buffer layer is formed on the base substrate having the conductive layer. The buffer layer includes a polymer-like carbon thin film. An alignment layer is formed on the buffer layer. The alignment layer includes a diamond-like carbon thin film containing fluorine. A content of hydrogen in the polymer-like carbon thin film is more than that in the diamond-like carbon thin film.
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Baik Hong-Koo
Rho Soon-Joon
Chen Bret
F. Chau & Associates LLC
Samsung Electronics Co,. Ltd.
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