Method of manufacturing a semiconductor memory device

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate

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438254, 438397, H01L 218242

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active

061469424

ABSTRACT:
A lower electrode of a capacitor is provided on a semiconductor substrate. The lower electrode includes an axis portion and a horizontal portion. An upper electrode of the capacitor is provided above the semiconductor substrate to cover the outer surface of the axis portion and the outer surface of the horizontal portion.

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"Novel Stacked Capacitor Cell for 64Mb DRAM", by Wakamiya et al., VL Sympo., 1989, pp. 69-70.
"3-Dimensional Stacked Capacitor Cell for 16M and 64M DRAMS", by Ena et al., 1988 IEEE, pp. 592-595.

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