Method of manufacturing a semiconductor integrated circuit devic

Details Method of manufacturing a semiconductor integrated circuit devic Method of manufacturing a semiconductor integrated circuit devic

1996-08-26

1999-08-03

Chang, Joni

Semiconductor device manufacturing: process

Making field effect device having pair of active regions...

Having insulated gate

438253, H01L 218242

Patent

active

059337249

ABSTRACT:
A phase shifting mask is used for manufacturing a semiconductor integrated circuit device including a conductor pattern in which the line width of patterned conductor strips or the space between patterned conductor strips is not constant. For main transparent areas in the mask corresponding to the conductor pattern, auxiliary pattern segments are provided for compensating changes in the phase distribution of transmitted light caused by changes of the line width or the space. Alternately, the spaces between the conductor strips are adjusted to suppress the changes in the phase distribution of transmitted light. Whether the auxiliary pattern segments should have the phase shifting function is determined depending upon the disposition of the main transparent areas.

REFERENCES:
patent: 5455144 (1995-10-01), Okamoto et al.
patent: 5502001 (1996-03-01), Okamoto
patent: 5583069 (1996-12-01), Ahn et al.

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