Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Electron beam imaging
Patent
1990-10-25
1992-08-18
Robinson, Ellis P.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Electron beam imaging
430270, 430312, 430327, 430330, 430394, 430942, 2504923, 427384, G03C 500
Patent
active
051399229
ABSTRACT:
A thin film of conductive high molecular compound is formed on a substrate such as Si followed by a heat treatment, and thereafter an electron beam exposure and subsequent development are made, to form pattern of the thin film of conductive high molecular compound; this method can eliminate forming of metal film to prevent the electron charge, can prevent charging of resist in electron-beam exposure or further prevent proximity effect when combined with deep ultraviolet light exposure.
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"Conductive Electron-beam Resist", Japan Materials News, Mar. 1988.
Fukuda Mitsutoshi
Hasegawa Masazumi
Todokoro Yoshihiro
Watanabe Hisashi
Loney Donald J.
Matsushita Electronics Corporation
Robinson Ellis P.
Tosoh Corporation
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