Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Electron beam imaging
Patent
1995-09-21
1996-07-02
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Electron beam imaging
430311, 430313, 430325, 430330, 430942, 430966, 430967, G03F 738
Patent
active
055321135
ABSTRACT:
A photoresist is provided. The photoresist comprises a polymer, a photoactive agent, and a crosslinking agent. The crosslinking agent comprises a water soluble sugar. The present invention also provides a method of making microelectronic structures.
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Frechet Jean M. J.
Lee Sze-Ming
Bowers Jr. Charles L.
Cornell Research Foundation
Young Christopher G.
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