Method of making BIOMEMS devices

Semiconductor device manufacturing: process – Making device or circuit responsive to nonelectrical signal – Physical stress responsive

Reexamination Certificate

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C438S051000, C257SE21632

Reexamination Certificate

active

07927904

ABSTRACT:
A MEMS device is manufactured by first forming a self-aligned monolayer (SAM) on a carrier wafer. Next, a first polymer layer is formed on the self-aligned monolayer. The first polymer layer is patterned form a microchannel cover, which is then bonded to a patterned second polymer layer on a device wafer to form microchannels. The carrier wafer is then released from the first polymer layer.

REFERENCES:
patent: 5705018 (1998-01-01), Hartley
patent: 6117643 (2000-09-01), Simpson et al.
patent: 6131410 (2000-10-01), Swierkowski et al.
patent: 6167910 (2001-01-01), Chow
patent: 2007/0148588 (2007-06-01), Park et al.
patent: 2008/0210933 (2008-09-01), Meng
“Capacitance Cytometry: Measuring Biological Cells One by One”, L.L. Sohn et al., Department of Physics and Molecular Biology, Princeton University, Princeton, NJ, 08544, Sep. 26, 2000, vol. 97, No. 20, p. 10687-10690.

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