Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
Patent
1997-07-09
2000-07-11
Nguyen, Tuan H.
Semiconductor device manufacturing: process
Making field effect device having pair of active regions...
Having insulated gate
438275, H01L 218236
Patent
active
060872284
ABSTRACT:
The invention relates to a method of automatically shifting from the fabrication of an EPROM cell to the fabrication of a ROM cell, which method is specifically intended for semiconductor electronic circuits having a resident memory and is of the type wherein the structure of at least one memory cell transistor is defined on a semiconductor substrate using photolithographic techniques including an active area and a channel region, the cell being adapted to acquire a logic state selected by the user. Advantageously, the conductivity of the active area is changed to suit the logical contents that the cell is intended to contain.
REFERENCES:
patent: 4992391 (1991-02-01), Wang
patent: 5183773 (1993-02-01), Miyata
patent: 5272099 (1993-12-01), Chou et al.
patent: 5407852 (1995-04-01), Ghio et al.
patent: 5441904 (1995-08-01), Kim et al.
patent: 5517061 (1996-05-01), Azmanov
patent: 5646430 (1997-07-01), Kaya et al.
patent: 5710454 (1998-01-01), Wu
patent: 5721440 (1998-02-01), Kowalski
patent: 5789297 (1998-08-01), Wang et al.
patent: 5814853 (1998-09-01), Chen
patent: 5840607 (1998-11-01), Yeh et al.
Ghio Emilio
Meroni Giuseppe
Chen Jack
Galanthay Theodore E.
Iannucci Robert
Nguyen Tuan H.
STMicroelectronics S. r. l.
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