Method of locating areas in an image such as a photo mask...

Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design

Reexamination Certificate

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C716S030000

Reexamination Certificate

active

07155698

ABSTRACT:
Images such as mask layouts, signatures, and photographs are compared to identify similarities or dissimilarities in the images. Descriptions of the images use geometric shapes including lines, rectangles, and triangles to facilitate the comparisons and decrease comparison time and decrease stored data describing the shapes. Data for pixels in the shapes are pre-integrated to reduce arithmetic operations in the comparisons.

REFERENCES:
patent: 5455427 (1995-10-01), Lepselter et al.
patent: 5539752 (1996-07-01), Berezin et al.
patent: 6301697 (2001-10-01), Cobb
patent: 6430737 (2002-08-01), Cobb et al.
patent: 7003757 (2006-02-01), Pierrat et al.
patent: 2003/0061583 (2003-03-01), Malhotra
patent: 2003/0126581 (2003-07-01), Pang et al.

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