Optics: measuring and testing – By configuration comparison – With photosensitive film or plate
Patent
1984-10-02
1988-01-12
Rosenberger, R. A.
Optics: measuring and testing
By configuration comparison
With photosensitive film or plate
356314, G01K 1100
Patent
active
047187670
ABSTRACT:
A method whereby the circuit pattern on a photographic mask or a reticle used in the manufacture of semiconductor devices is inspected for defects by an image processing technique. In this inspection method, the pattern of the mask is printed on a photosensitive member prepared by forming an opaque or semitransparent photosensitive layer on a transparent substrate and an image of the printed pattern formed on the photosensitive member is inspected by the image processing technique.
REFERENCES:
patent: 3617744 (1971-11-01), Irish
patent: 3963354 (1976-06-01), Feldman et al.
patent: 4131472 (1978-12-01), MacDonald, Jr. et al.
patent: 4200396 (1980-04-01), Kleinknecht et al.
patent: 4209257 (1980-06-01), Uchiyama et al.
Cooper Crystal D.
Meller Michael N.
Nippon Kogaku K.K.
Rosenberger R. A.
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