Method of inspecting the pattern on a photographic mask

Details Method of inspecting the pattern on a photographic mask Method of inspecting the pattern on a photographic mask

1984-10-02

1988-01-12

Rosenberger, R. A.

Optics: measuring and testing

By configuration comparison

With photosensitive film or plate

356314, G01K 1100

Patent

active

047187670

ABSTRACT:
A method whereby the circuit pattern on a photographic mask or a reticle used in the manufacture of semiconductor devices is inspected for defects by an image processing technique. In this inspection method, the pattern of the mask is printed on a photosensitive member prepared by forming an opaque or semitransparent photosensitive layer on a transparent substrate and an image of the printed pattern formed on the photosensitive member is inspected by the image processing technique.

REFERENCES:
patent: 3617744 (1971-11-01), Irish
patent: 3963354 (1976-06-01), Feldman et al.
patent: 4131472 (1978-12-01), MacDonald, Jr. et al.
patent: 4200396 (1980-04-01), Kleinknecht et al.
patent: 4209257 (1980-06-01), Uchiyama et al.

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