Optics: measuring and testing – Inspection of flaws or impurities – Surface condition
Reexamination Certificate
2006-06-29
2009-02-03
Stafira, Michael P (Department: 2886)
Optics: measuring and testing
Inspection of flaws or impurities
Surface condition
C356S237300, C356S237400
Reexamination Certificate
active
07486392
ABSTRACT:
In a method of inspecting an object, a first light is irradiated onto a bare object and a first reflection signal is reflected from the bare object. A second light is irradiated onto a processed object and a second reflection signal is reflected from the processed object. The first and second reflection signals are differentiated, to thereby generate respective first and second differential signals. A defect on the processed object is detected by a comparison between the first and second differential signals. The first and second differential signals overlap with each other and at least one signal-deviation portion is detected. The first and second differential signals are spaced apart out of an allowable error range in the signal-deviation portion. The defect is detected from a portion of the processed object corresponding to the signal-deviation portion.
REFERENCES:
patent: 5604585 (1997-02-01), Johnson et al.
patent: 2005/0248756 (2005-11-01), Lin et al.
patent: 09-061344 (1997-03-01), None
patent: 09-203621 (1997-08-01), None
patent: 10-185535 (1998-07-01), None
patent: 1995-0006428 (1995-03-01), None
patent: 2001-0053397 (2001-06-01), None
patent: 1020020021062 (2002-03-01), None
patent: 1020040062299 (2004-07-01), None
Chung Ki-Suk
Jun Chung-Sam
Kim Tae-Sung
Lee Byung-Sug
Yang Yu-Sin
Samsung Electronics Co,. Ltd.
Stafira Michael P
Volentine & Whitt PLLC
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