Method of imaging using a polymeric photoresist having pendant v

Details Method of imaging using a polymeric photoresist having pendant v Method of imaging using a polymeric photoresist having pendant v

1995-05-24

1997-04-01

Schofer, Joseph L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

4302701, G03F 730

Patent

active

056164513

ABSTRACT:
Multi-functional vinylbenzyl and vinylphenyl pendant thymine (and uracil) groups are disclosed. The monomers can be used for the production of polymers useful in photoresist and other compositions as a function of the crosslinking reactivity of the pendant groups. Images in polymer are provided by exposure to actinic radiation (e.g., UV), containing such polymer and by solvent removal of non-exposed regions.

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