Method of growing electrical conductors

Details Method of growing electrical conductors Method of growing electrical conductors

2003-03-20

2009-02-24

Nguyen, Dao H (Department: 2818)

Semiconductor device manufacturing: process

Coating with electrically or thermally conductive material

To form ohmic contact to semiconductive material

C438S597000, C438S628000, C438S629000, C438S686000, C438S687000, C257S200000, C257S295000, C257SE21495, C257SE21585, C257SE27004

Reexamination Certificate

active

07494927

ABSTRACT:
A method for forming a conductive thin film includes depositing a metal oxide thin film on a substrate by an atomic layer deposition (ALD) process. The method further includes at least partially reducing the metal oxide thin film by exposing the metal oxide thin film to a reducing agent, thereby forming a seed layer. In one arrangement, the reducing agent comprises one or more organic compounds that contain at least one functional group selected from the group consisting of —OH, —CHO, and —COOH. In another arrangement, the reducing agent comprises an electric current.

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