Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Reexamination Certificate
2011-06-07
2011-06-07
Nguyen, Dao H (Department: 2818)
Semiconductor device manufacturing: process
Coating with electrically or thermally conductive material
To form ohmic contact to semiconductive material
C438S597000, C438S627000, C438S628000, C438S686000, C257S751000, C257S762000, C257S774000, C257SE21495, C257SE21585, C257SE27004, C257SE27006
Reexamination Certificate
active
07955979
ABSTRACT:
A method for forming a conductive thin film includes depositing a metal oxide thin film on a substrate by an atomic layer deposition (ALD) process. The method further includes at least partially reducing the metal oxide thin film by exposing the metal oxide thin film to a reducing agent, thereby forming a seed layer. In one arrangement, the reducing agent comprises one or more organic compounds that contain at least one functional group selected from the group consisting of —OH, —CHO, and —COOH. In another arrangement, the reducing agent comprises an electric current.
REFERENCES:
patent: 4058430 (1977-11-01), Suntola et al.
patent: 4210608 (1980-07-01), Pinke
patent: 4477296 (1984-10-01), Nair
patent: 4604118 (1986-08-01), Bocko et al.
patent: 4670110 (1987-06-01), Withers et al.
patent: 4860687 (1989-08-01), Frijlink
patent: 4891050 (1990-01-01), Bowers et al.
patent: 4902551 (1990-02-01), Nakaso et al.
patent: 4965656 (1990-10-01), Koubuchi et al.
patent: 5106454 (1992-04-01), Allardyce et al.
patent: 5382333 (1995-01-01), Ando et al.
patent: 5391517 (1995-02-01), Gelatos et al.
patent: 5453494 (1995-09-01), Kirlin et al.
patent: 5637533 (1997-06-01), Choi
patent: 5695810 (1997-12-01), Dubin et al.
patent: 5711811 (1998-01-01), Suntola et al.
patent: 5731634 (1998-03-01), Matsuo et al.
patent: 5820664 (1998-10-01), Gardiner et al.
patent: 5865365 (1999-02-01), Nishikawa et al.
patent: 5874600 (1999-02-01), Rautenstrauch et al.
patent: 5884009 (1999-03-01), Okase
patent: 5916365 (1999-06-01), Sherman
patent: 5923056 (1999-07-01), Lee et al.
patent: 5939334 (1999-08-01), Nguyen et al.
patent: 5989672 (1999-11-01), Hayashi
patent: 5998048 (1999-12-01), Jin et al.
patent: 6006763 (1999-12-01), Mori et al.
patent: 6015986 (2000-01-01), Schuegraf
patent: 6033584 (2000-03-01), Ngo et al.
patent: 6040243 (2000-03-01), Li et al.
patent: 6063705 (2000-05-01), Vaartstra
patent: 6066892 (2000-05-01), Ding et al.
patent: 6074945 (2000-06-01), Vaartstra et al.
patent: 6108937 (2000-08-01), Raaijmakers
patent: 6124189 (2000-09-01), Watanabe et al.
patent: 6130123 (2000-10-01), Liang et al.
patent: 6133159 (2000-10-01), Vaartstra et al.
patent: 6136163 (2000-10-01), Cheung et al.
patent: 6139700 (2000-10-01), Kang et al.
patent: 6143658 (2000-11-01), Donnelly et al.
patent: 6144060 (2000-11-01), Park et al.
patent: 6171910 (2001-01-01), Hobbs et al.
patent: 6203613 (2001-03-01), Gates et al.
patent: 6268291 (2001-07-01), Andricacos et al.
patent: 6270572 (2001-08-01), Kim et al.
patent: 6281125 (2001-08-01), Vaartstra et al.
patent: 6294467 (2001-09-01), Yokoyama et al.
patent: 6297539 (2001-10-01), Ma et al.
patent: 6303500 (2001-10-01), Jiang et al.
patent: 6305314 (2001-10-01), Sneh et al.
patent: 6306756 (2001-10-01), Hasunuma et al.
patent: 6320213 (2001-11-01), Kirlin et al.
patent: 6323131 (2001-11-01), Obeng et al.
patent: 6335280 (2002-01-01), Van der Jeugd
patent: 6342277 (2002-01-01), Sherman
patent: 6346151 (2002-02-01), Jiang et al.
patent: 6359159 (2002-03-01), Welch et al.
patent: 6380080 (2002-04-01), Visokay
patent: 6391785 (2002-05-01), Satta et al.
patent: 6395650 (2002-05-01), Callegari et al.
patent: 6403414 (2002-06-01), Marsh
patent: 6404191 (2002-06-01), Daughton et al.
patent: 6420189 (2002-07-01), Lopatin
patent: 6433432 (2002-08-01), Shimizu
patent: 6444568 (2002-09-01), Sundararajan et al.
patent: 6444868 (2002-09-01), Vaughn et al.
patent: 6455424 (2002-09-01), McTeer et al.
patent: 6464779 (2002-10-01), Powell et al.
patent: 6475276 (2002-11-01), Elers et al.
patent: 6478931 (2002-11-01), Wadley et al.
patent: 6482733 (2002-11-01), Raaijmakers et al.
patent: 6482740 (2002-11-01), Soininen et al.
patent: 6511539 (2003-01-01), Raaijmakers
patent: 6534395 (2003-03-01), Werkhoven et al.
patent: 6541067 (2003-04-01), Marsh et al.
patent: 6551399 (2003-04-01), Sneh et al.
patent: 6576053 (2003-06-01), Kim et al.
patent: 6586330 (2003-07-01), Ludviksson et al.
patent: 6593656 (2003-07-01), Ahn et al.
patent: 6617173 (2003-09-01), Sneh
patent: 6649091 (2003-11-01), Ryan et al.
patent: 6656748 (2003-12-01), Hall et al.
patent: 6664192 (2003-12-01), Satta et al.
patent: 6679951 (2004-01-01), Soininen et al.
patent: 6680540 (2004-01-01), Nakano et al.
patent: 6703708 (2004-03-01), Werkhoven et al.
patent: 6713381 (2004-03-01), Barr et al.
patent: 6720262 (2004-04-01), Koh et al.
patent: 6759325 (2004-07-01), Raaijmakers et al.
patent: 6777331 (2004-08-01), Nguyen
patent: 6784101 (2004-08-01), Yu et al.
patent: 6784504 (2004-08-01), Derderian et al.
patent: 6800542 (2004-10-01), Kim
patent: 6800567 (2004-10-01), Cho et al.
patent: 6824816 (2004-11-01), Aaltonen et al.
patent: 6842740 (2005-01-01), Jeran et al.
patent: 6849122 (2005-02-01), Fair
patent: 6852635 (2005-02-01), Satta et al.
patent: 6878628 (2005-04-01), Sophie et al.
patent: 6881260 (2005-04-01), Marsh et al.
patent: 6881437 (2005-04-01), Ivanov et al.
patent: 6887795 (2005-05-01), Soininen et al.
patent: 6921712 (2005-07-01), Soininen et al.
patent: 6933225 (2005-08-01), Werkhoven et al.
patent: 6936535 (2005-08-01), Kim et al.
patent: 6955986 (2005-10-01), Li
patent: 6984591 (2006-01-01), Buchanan et al.
patent: 7011981 (2006-03-01), Kim et al.
patent: 7067407 (2006-06-01), Kostamo et al.
patent: 7105054 (2006-09-01), Lindfors
patent: 7107998 (2006-09-01), Greer et al.
patent: 7118779 (2006-10-01), Verghese et al.
patent: 7135207 (2006-11-01), Min et al.
patent: 7183604 (2007-02-01), Cartier
patent: 7211509 (2007-05-01), Gopinath et al.
patent: 7220451 (2007-05-01), Aaltonen et al.
patent: 7220669 (2007-05-01), Hujanen et al.
patent: 7241677 (2007-07-01), Soininen et al.
patent: 7256144 (2007-08-01), Koyanagi et al.
patent: 7273526 (2007-09-01), Shinriki et al.
patent: 7273814 (2007-09-01), Matsuda
patent: 7300873 (2007-11-01), Millward
patent: 7404985 (2008-07-01), Chang et al.
patent: 7419903 (2008-09-01), Haukka et al.
patent: 7435484 (2008-10-01), Shinriki et al.
patent: 7438949 (2008-10-01), Weidman
patent: 7476618 (2009-01-01), Kilpela et al.
patent: 7494927 (2009-02-01), Kostamo et al.
patent: 7541284 (2009-06-01), Park
patent: 7601223 (2009-10-01), Lindfors et al.
patent: 7615480 (2009-11-01), Boyd
patent: 7655564 (2010-02-01), Shinriki
patent: 7666773 (2010-02-01), Huotari et al.
patent: 2001/0003064 (2001-06-01), Ohto
patent: 2001/0013617 (2001-08-01), Toyoda et al.
patent: 2001/0018266 (2001-08-01), Jiang et al.
patent: 2001/0030366 (2001-10-01), Nakano et al.
patent: 2001/0041250 (2001-11-01), Werkhoven et al.
patent: 2001/0052318 (2001-12-01), Jiang et al.
patent: 2002/0004293 (2002-01-01), Soininen et al.
patent: 2002/0006711 (2002-01-01), Yamazaki et al.
patent: 2002/0013487 (2002-01-01), Norman et al.
patent: 2002/0027286 (2002-03-01), Sundararajan et al.
patent: 2002/0064948 (2002-05-01), Saito et al.
patent: 2002/0146513 (2002-10-01), Jin et al.
patent: 2002/0173054 (2002-11-01), Kim
patent: 2003/0013302 (2003-01-01), Nguyen
patent: 2003/0059535 (2003-03-01), Luo et al.
patent: 2003/0080363 (2003-05-01), Maruyama et al.
patent: 2003/0100162 (2003-05-01), Joo
patent: 2003/0121608 (2003-07-01), Chen et al.
patent: 2003/0135061 (2003-07-01), Norman et al.
patent: 2003/0165615 (2003-09-01), Aaltonen et al.
patent: 2003/0214043 (2003-11-01), Saitoh et al.
patent: 2003/0219991 (2003-11-01), Geusic et al.
patent: 2003/0233976 (2003-12-01), Marsh et al.
patent: 2004/0005753 (2004-01-01), Kostamo et al.
patent: 2004/0028952 (2004-02-01), Cartier et al.
patent: 2004/0038529 (2004-02-01), Soininen et al.
patent: 2004/0041194 (2004-03-01), Marsh
patent: 2004/0053496 (2004-03-01), Choi
patent: 2004/0082125 (2004-04-01), Hou et al.
patent: 2004/0087143 (2004-05-01), Norman et al.
patent: 2004/0095792 (2004-05-01), Herrmann et al.
patent: 2004/0105934 (2004-06-01), Chang et al.
patent: 2004/0118697 (2004-06-01), Wen et al.
patent: 2004/0126944 (2004-07-01), Rotondaro et al.
patent: 2004/0142558 (2004-07-01), Granneman
patent: 2004/0152255 (2004-08-01), Seidl et al.
patent: 2004/0192021 (2004-09-01), Li
patent: 2004/0192036 (2004-09-01), Koyanagi et al.
patent: 2004/0214354 (2004-10-0
Elers Kai-Erik
Haukka Suvi
Kostamo Juhana
Soininen Pekka J.
ASM International N.V.
Knobbe Martens Olson & Bear LLP
Nguyen Dao H
LandOfFree
Method of growing electrical conductors does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method of growing electrical conductors, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of growing electrical conductors will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2735613