Method of forming resist pattern and resist processing apparatus

Details Method of forming resist pattern and resist processing apparatus Method of forming resist pattern and resist processing apparatus

1987-12-07

1990-08-07

Dees, Jose G.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430326, 430327, 430330, 4273741, G03C 516

Patent

active

049467646

ABSTRACT:
A method for forming a resist pattern comprises the steps of coating a resist on a substrate, baking the resist, selectively radiating electromagnetic waves or particle rays onto a surface of the resists, and developing the resist. The method further comprises, after the baking step and before the developing step, the step of cooling the resist in such a manner that a temperature control plate is disposed parallel to and adjacent to the substrate.

REFERENCES:
patent: 4717645 (1988-01-01), Kato et al.

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