Method of forming resist pattern

Details Method of forming resist pattern Method of forming resist pattern

1984-05-03

1985-08-20

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Electron beam imaging

427 44, 427 541, 20415919, 20415913, 430281, 430288, 430322, 430325, 430328, 430330, G03C 500

Patent

active

045364680

ABSTRACT:
A method of forming a resist pattern, which comprises printing a predetermined pattern on a substrate by a lithographic technique using a resist ink curable by irradiation of an active energy ray and/or heating, said ink containing (1) a metal chelate resin obtained by reacting (a) at least one resin selected from the group consisting of alkyd resins, modified alkyd resins, fatty acid-modified epoxy resins, urethanized oils and maleinized oils and (b) a metal compound capable of forming a coordination bond using the resin (a) as a ligand and (2) a polymerizable compound containing at least two ethylenically unsaturated bonds per molecule; and curing the printed pattern by irradiating an active energy ray and/or by heating.

REFERENCES:
patent: 3876432 (1975-04-01), Carlick et al.
patent: 4064287 (1977-12-01), Lipson et al.
patent: 4271258 (1981-06-01), Watariguchi
patent: 4306012 (1981-12-01), Scheve

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