Method of forming relief image having line width less than 0.35

Details Method of forming relief image having line width less than 0.35 Method of forming relief image having line width less than 0.35

1994-04-15

1994-11-29

Baxter, Janet C.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430326, 430909, G03F 730

Patent

active

053689933

ABSTRACT:
The present invention relates to photoresists particularly suitable for deep U.V. exposure and having the capability of forming highly resolved features. The invention is characterized by use of a resist resin binder that comprises a nonaromatic cyclic alcohol-phenol copolymer that has a relatively low molecular weight and narrow distribution of molecular weight and cyclic alcohol concentration.

REFERENCES:
patent: 5128232 (1992-07-01), Thackeray et al.

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