Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Patent
1995-11-29
1997-08-19
Lesmes, George F.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
430325, 430323, 430313, G03F 7004
Patent
active
056587112
ABSTRACT:
A relatively thick metal oxide film of 100 nm or more is formed in the exposed portion of a resist film by supplying water and a metal alkoxide thereto, and then evaporating the alcohol generated by the supply of metal alkoxide to form a precise resist pattern from the metal oxide film. Water is absorbed into the exposed portion of the resist film in which the acid has been generated and the water is diffused deeper into the surface thereof. The growth of the metal oxide film proceeds toward the interior of the resist film. The water absorbed by the resist film is prevented from being evaporated, thereby forming a metal oxide film with a sufficiently large thickness to withstand dry etching.
REFERENCES:
patent: 5278029 (1994-01-01), Shirai et al.
Endo Masayuki
Matsuo Takahiro
Sasago Masaru
Yamashita Kazuhiro
Lesmes George F.
Matsushita Electric - Industrial Co., Ltd.
VerSteeg Steven H.
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