Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Electron beam imaging
Patent
1996-02-20
1997-12-02
Hamilton, Cynthia
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Electron beam imaging
430942, 2504923, G03F 722
Patent
active
056934530
ABSTRACT:
A method of forming a micro dot pattern by using an electron beam exposure apparatus which sets a minimum unit moving distance of an electron beam smaller than an electron beam diameter includes the steps of defining one of lattice points formed for every minimum unit moving distance of the electron beam as a reference position, and irradiating the electron beam on at least two lattice points within an area separated from the reference position by a distance smaller than the electron beam diameter in an equal exposure amount or different exposure amounts to form a pattern having a center at an exposure peak position in a sum of the plurality of exposure amounts, thereby forming the micro dot pattern having a center at a position other than the lattice points.
REFERENCES:
patent: 5112724 (1992-05-01), Bradshaw
patent: 5415835 (1995-05-01), Brueck et al.
patent: 5466548 (1995-11-01), Matsui
M. Suehiro et al.; "GaAs/A1GaAs First-Order Gratings Fabricated with Electron Beam Lithography and Very-Narrow-Linewidth Long-Cavity DBR Laser Diodes"; IEEE Journal of Quantum Electronics, vol. 29, No. 6, Jun. 1993, pp. 2081-2087.
T. Kjellberg et al.; "The Effect of Stitching Errors on the Spectral Characteristics of DFB Lasers Fabricated using Electron Beam Lithography"; Journal of Lightwave Technology, vol. 10, No. 9, Sep. 1992, pp. 1256-1266.
Hamilton Cynthia
NEC Corporation
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