Method of forming interlayer film

Details Method of forming interlayer film Method of forming interlayer film

1998-06-30

2000-04-11

Nelms, David

Semiconductor device manufacturing: process

Coating of substrate containing semiconductor region or of...

Multiple layers

438760, 438778, 438784, 438788, H01L 2131

Patent

active

060488018

ABSTRACT:
A method of forming an interlayer film on a substrate with a plurality of patterns formed thereon wherein the interlayer film is deposited on the substrate by a process comprising a plurality of steps in each of which a portion of the film is deposited so as to have different fluidity with the same source material.

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patent: 5703404 (1997-12-01), Matsuura

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