Method of forming holographic grating

Details Method of forming holographic grating Method of forming holographic grating

2006-10-31

2006-10-31

Deo, Duy-Vu N (Department: 1765)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

C430S326000, C430S327000, C430S328000, C430S329000, C216S024000, C216S041000, C216S048000

Reexamination Certificate

active

07129028

ABSTRACT:
In a method of forming a holographic grating, a photoresist layer is formed on an optical substrate, and a resist pattern is formed in the photoresist layer to have grooves depth deeper than a predetermined depth of diffraction grating grooves to be formed. Then, the photoresist layer with the resist pattern is etched by an ion beam generated by a mixed gas containing a fluorine based gas and oxygen until the resist pattern is substantially completely disappears. Thus, the diffraction grating grooves having the predetermined depth are directly engraved on the optical glass plate.

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