Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2008-03-19
2011-10-18
Walke, Amanda C. (Department: 1722)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S311000, C430S312000, C430S313000, C430S317000, C430S322000, C430S331000, C430S273100
Reexamination Certificate
active
08039196
ABSTRACT:
A method of patterning a substrate includes processing first regions of the substrate to form a first pattern, the first regions defining a second region between adjacent first regions, arranging a block copolymer on the first and second regions, the block copolymer including a first component and a second component, the first component of the block copolymer being aligned on the first regions, and selectively removing one of the first component and the second component of the block copolymer to form a second pattern having a pitch that is less than a pitch of a first region and an adjacent second region.
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Choi Seong Woon
Kim Hyun Woo
Kim Kyoung Taek
Kim Sang Ouk
Yi Shi Yong
Lee & Morse P.C.
Samsung Electronics Co,. Ltd.
Walke Amanda C.
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