Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Patent
1988-11-22
1991-03-05
Dees, Jose G.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
430316, 430317, 430318, 430328, 437229, G03F 726
Patent
active
049977466
ABSTRACT:
A method is provided for forming a conductive stud and line over a surface, comprising the steps of: forming at least a first layer of material over the region on the surface whereat the conductive stud and line are to be formed; forming a layer of dual image photoresist over the material; exposing the dual image potoresist to radiation so as to form at least first and second regions exhibiting different development characteristics; developing the first region so as to expose a portion of the material; removing the exposed portion of the material so as to define the position of one of the conductive line or stud; developing the second region to expose more of the material; and removing the newly exposed portion of material so as to define the position of the other of the conductive line or stud.
REFERENCES:
patent: 3930857 (1976-01-01), Bendz et al.
patent: 4315984 (1982-02-01), Okazaki et al.
patent: 4541893 (1985-09-01), Knight
patent: 4579812 (1986-04-01), Boner
patent: 4721689 (1988-01-01), Chaloux et al.
patent: 4767723 (1988-08-01), Hinsberg et al.
patent: 4789648 (1988-12-01), Chow et al.
"Zero-Misalignment Lithographic Process Using a Photoresist with Wavelength-Selected Tone," by Hinsberg et al., SPIE, vol. 920, Advances in Resist Technology and Processing V (1988).
Greco Nancy A.
Greco Stephen E.
Brandt Jeffrey L.
Dees Jos,e G.
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