Method of forming an integrated optical polarization grid on...

Details Method of forming an integrated optical polarization grid on... Method of forming an integrated optical polarization grid on...

2011-05-31

2011-05-31

Nelms, David (Department: 2871)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making named article

C349S096000, C216S024000, C359S486010

Reexamination Certificate

active

07951527

ABSTRACT:
A method of forming a wire grid polarizing pattern across the relatively large surface area of a display substrate includes using a nano imprint lithograph process wherein wire grid polarizing patterns are formed by bonding a stamp having a stamping area substantially smaller than that of the substrate with successive reticle areas of the substrate, where the substrate has a photosensitive film deposited thereon and where the stamping is such that recesses having a predetermined depth are formed in the photosensitive film, and then filling the recesses with an insulating film and etching it using the insulating film as a mask. Since mechanical misalignment margin is acceptable from one reticle area to the next, a wire grid polarizing pattern with a uniform line width and spacings in each reticle area can be formed on a substrate having a large area.

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