Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Reexamination Certificate
2006-05-25
2008-11-25
Lee, Hsien-ming (Department: 2823)
Semiconductor device manufacturing: process
Coating with electrically or thermally conductive material
To form ohmic contact to semiconductive material
C438S671000, C438S672000, C438S675000, C438S700000, C438S717000, C257SE21231
Reexamination Certificate
active
07456099
ABSTRACT:
A semiconductor structure includes a plurality of conductive lines formed within an interlevel dielectric (ILD) layer and a non-planar cap layer formed over the ILD layer and the conductive lines, wherein the cap layer is raised with respect to the conductive lines at locations between the conductive lines.
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Clevenger Lawrence A.
Grunow Stephan
Kumar Kaushik A.
Petrarca Kevin S.
Ramachandran Vidhya
Cantor & Colburn LLP
International Business Machines - Corporation
Jaklitsch Lisa U.
Lee Hsien-ming
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