Method of forming a resist pattern by radiation exposure of posi

Details Method of forming a resist pattern by radiation exposure of posi Method of forming a resist pattern by radiation exposure of posi

1986-06-26

1987-03-17

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430330, G03F 726

Patent

active

046507450

ABSTRACT:
Disclosed is a positive-working resist composition which demonstrates improved photospeed and rate of development. The resist composition contains a solvent and select proportions of a novolak resin, a naphthoquinone diazide sensitizer, a dye which absorbs light at a maximum wavelength of from about 330 to about 460 nm and an effective proportion of a trihydroxybenzophenone compound. Also disclosed is a method of forming a resist pattern on a substrate by employing the positive-working resist composition.

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