Method of forming a resist pattern

Details Method of forming a resist pattern Method of forming a resist pattern

1997-10-07

2000-09-26

Letscher, Geraldine

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430322, 430325, 430326, 430329, 430330, 430349, 430350, 430290, G03C 500

Patent

active

061240818

ABSTRACT:
A negative type resist in which an alkali-soluble base resin, a crosslinking agent and an acid generating agent are dissolved in a solvent, wherein 10 through 50 wt % of the crosslinking agent and 0.5 through 20 wt % of the acid generating agent on the basis of 100 wt % of the alkali-soluble base resin are dissolved in the solvent.

REFERENCES:
patent: 4609615 (1986-09-01), Yamashita et al.
patent: 4801518 (1989-01-01), Yamashita et al.
patent: 5208133 (1993-05-01), Tsumori
patent: 5292614 (1994-03-01), Ochiai et al.
patent: 5364716 (1994-11-01), Nakagawa et al.
patent: 5389491 (1995-02-01), Tani et al.
patent: 5472813 (1995-12-01), Nakagawa et al.

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