Method of forming a relief image comprising amphoteric compositi

Details Method of forming a relief image comprising amphoteric compositi Method of forming a relief image comprising amphoteric compositi

1991-10-01

1994-05-24

McCamish, Marion E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430281, 430935, 2041816, 2041817, 2041806, G03F 730, G03C 173, C25D 1306

Patent

active

053147898

ABSTRACT:
The invention provides radiation sensitive compositions that comprise an amphoteric polymer, the polymer comprising at least two distinct carrier groups so that the polymer is positively polarized or negatively polarized upon treatment with an acid or base, respectively, enabling the compositions to be electrodeposited either anaphoretically or cataphoretically. Employing this amphoteric polymer in a radiation sensitive composition also allows the use of either an acid or base solution to image and remove the deposited composition irrespective of whether the composition was applied cataphoretically or anaphoretically. The compositions of the invention are also suitably formulated as liquid coating compositions or used to form dry film resists.

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