Method of forming a pattern

Details Method of forming a pattern Method of forming a pattern

1979-11-14

1981-12-22

Newsome, John H.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

427 431, 430328, 430330, 430326, B05D 306

Patent

active

043071767

ABSTRACT:
A method of forming a pattern comprising heat-treating a resist film subjected to irradiation with light and thereafter removing an unhardened area of the resist film.
Since the heat treatment reduces the film thickness of the unhardened area and hardens a hardened area still more, a pattern on the order of submicrons can be readily formed.

REFERENCES:
patent: 4015986 (1977-04-01), Paal et al.
Cortellino et al., "IBM TDB", vol. 15, No. 1, Jun. 1972.

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