Method of forming a negative resist pattern

Details Method of forming a negative resist pattern Method of forming a negative resist pattern

1979-07-03

1981-08-25

Louie, Jr., Won H.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Electron beam imaging

430325, 430270, 430287, B05D 306, G03C 516

Patent

active

042860490

ABSTRACT:
A method for forming a negative resist pattern which applies as a high energy beam-sensitive material a polymer consisting of components expressed by the general structural formula: ##STR1## where: X=halogen or ##STR2## (R.sub.2 is H or CH.sub.3) R.sub.1 =H or CH.sub.3

REFERENCES:
patent: 3457073 (1969-07-01), Delzenne
patent: 3535137 (1970-10-01), Haller et al.
patent: 3622321 (1971-11-01), Smets
patent: 3740376 (1973-06-01), Wolff et al.
patent: 3794510 (1974-02-01), Scala et al.
patent: 3996393 (1976-12-01), Cortellino et al.
Brewer: Factors Affecting the Sensitivity of E-Beam Resists, Polymer Engineering and Science, Jul. 1974, vol. 14, No. 7, pp. 534-537.

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