Method of forming a microscopic pattern

Details Method of forming a microscopic pattern Method of forming a microscopic pattern

1980-01-08

1981-09-08

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156656, 1566611, 156667, 204192E, 427132, 430313, 430318, C23F 102

Patent

active

042882834

ABSTRACT:
A method of forming a microscopic pattern wherein the object to be etched is overlaid with a film made of a material which is highly immune to etching and further provided with a reflection reducing film. Thus, the reflection of the irradiating ultraviolet rays by the underlying layer is effectively prevented.

REFERENCES:
patent: 3720143 (1973-03-01), Hashimoto et al.
patent: 3884698 (1975-05-01), Kakihama
patent: 3949463 (1976-04-01), Lindmayer et al.
patent: 4098917 (1978-07-01), Bullock et al.

Affiliated with

Also associated with

Rating

Method of forming a microscopic pattern does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of forming a microscopic pattern, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of forming a microscopic pattern will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1190976