Method of forming a highly pure thin film and apparatus therefor

Details Method of forming a highly pure thin film and apparatus therefor Method of forming a highly pure thin film and apparatus therefor

1998-03-12

2000-03-21

Nguyen, Nam

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

250423R, C23C 1434

Patent

active

060398477

ABSTRACT:
A material of ions is sputtered with cesium ions to generate negative ions and, the negative ions are accelerated and mass-separated to obtain a negative ion beam, and a material of thin film is sputtered with the negative ion beam, thereby forming a thin film on a base material.

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patent: 4980556 (1990-12-01), O'Connor et al.
patent: 5178738 (1993-01-01), Ishikawa et al.
patent: 5365070 (1994-11-01), Anderson et al.
patent: 5466941 (1995-11-01), Kim

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