Method of forming a film on a substrate

Details Method of forming a film on a substrate Method of forming a film on a substrate

1996-12-18

1999-01-05

Pianalto, Bernard

Coating processes

Direct application of electrical, magnetic, wave, or...

Plasma

427123, 4272553, 427264, 427265, 427270, 427271, 427307, 427404, 4274192, 427585, H05H 124

Patent

active

058559701

ABSTRACT:
An improved CVD apparatus for depositing a uniform film is shown. The apparatus comprises a reaction chamber, a substrate holder and a plurality of light sources for photo CVD or a pair of electrodes for plasma CVD. The substrate holder is a cylindrical cart which is encircled by the light sources, and which is rotated around its axis by a driving device. With this configuration, the substrates mounted on the cart and the surroundings can be energized by light of plasma evenly throughout the surfaces to be coated.

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