Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Reexamination Certificate
2009-05-04
2010-12-07
Garber, Charles D (Department: 2812)
Semiconductor device manufacturing: process
Coating with electrically or thermally conductive material
To form ohmic contact to semiconductive material
C257SE21295, C257SE21409
Reexamination Certificate
active
07846836
ABSTRACT:
A method of forming a conductive structure in a semiconductor device includes forming a conductive layer on a substrate, forming a conductive layer pattern on the substrate by patterning the conductive layer, forming an oxide layer on the substrate and a portion of the conductive layer, and forming a capping layer on the oxide layer and the conductive layer pattern.
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Hwang Ki-Hyun
Kim Jin-Gyun
Lee Dong-Kak
Garber Charles D
Isaac Stanetta D
Lee & Morse P.C.
Samsung Electronics Co,. Ltd.
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