Coating processes – Measuring – testing – or indicating
Reexamination Certificate
2007-04-10
2007-04-10
Chen, Bret (Department: 1762)
Coating processes
Measuring, testing, or indicating
C427S009000, C427S248100, C427S255230
Reexamination Certificate
active
10174377
ABSTRACT:
A method of film deposition in a sub-atmospheric chemical vapor deposition (CVD) process includes (a) providing a model for sub-atmospheric CVD deposition of a film that identifies one or more film properties of the film and at least one deposition model variable that correlates with the one or more film properties; (b) depositing a film onto a wafer using a first deposition recipe comprising at least one deposition recipe parameter that corresponds to the at least one deposition variable; (c) measuring a film property of at least one of said one or more film properties for the deposited film of step (b); (d) calculating an updated deposition model based upon the measured film property of step (c) and the model of step (a); and (e) calculating an updated deposition recipe based upon the updated model of step (d) to maintain a target film property. The method can be used to provide feedback to a plurality of deposition chambers or to control a film property other than film thickness.
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Hernandez Manuel
Mohammad Amna
Pan Rong
Schwarm Alexander T.
Shanmugasundram Arulkumar P.
Applied Materials Inc.
Chen Bret
Wilmer, Cutler & Hale
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