Electricity: electrical systems and devices – Electric charge generating or conducting means – Use of forces of electric charge or field
Reexamination Certificate
2008-05-20
2008-05-20
Sherry, Michael (Department: 2836)
Electricity: electrical systems and devices
Electric charge generating or conducting means
Use of forces of electric charge or field
C361S233000, C279S128000, C216S067000, C216S069000
Reexamination Certificate
active
07375947
ABSTRACT:
In a plasma reactor having an electrostatic chuck, wafer voltage is determined from RF measurements at the bias input using previously determined constants based upon transmission line properties of the bias input, and this wafer voltage is used to accurately control the DC wafer clamping voltage.
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King, Ronald W.P., “Transmission-Line Theory”, Dover Publications, Inc., 1965, New York, pp. 1-10 and 282-286.
Burns Douglas H.
Hoffman Daniel J.
Kim Kwang-Soo
Lee Won-seok
Shannon Steven C.
Applied Materials Inc.
Kitov Zeev
Sherry Michael
Wallace Robert M.
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