Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Electron beam imaging
Patent
1997-05-12
2000-12-26
Duda, Kathleen
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Electron beam imaging
430313, 438798, G03F 700
Patent
active
061656887
ABSTRACT:
A metastable depassivation lithography process for fabricating microstructures on a surface which utilizes the energy contained in neutral metastable rare gas atoms to remove passivating atoms from selected areas of a surface. Removal of the passivating atoms in a pattern allows further chemical processing to add or remove material to the exposed areas. The neutral metastable rare gas atoms can be directed to the surface using atom optical techniques to effect a desired pattern of exposure by the atoms. Alternatively, a mask can be used to effect a desired pattern of exposure.
REFERENCES:
patent: 4331504 (1982-05-01), Chuang et al.
patent: 4615756 (1986-10-01), Tsujii et al.
patent: 4828874 (1989-05-01), Hiraoka et al.
patent: 4936940 (1990-06-01), Kawasumi et al.
patent: 4937094 (1990-06-01), Doehler et al.
patent: 4960495 (1990-10-01), Mori et al.
patent: 5024724 (1991-06-01), Hirono et al.
patent: 5037666 (1991-08-01), Mori
patent: 5340684 (1994-08-01), Hayase et al.
patent: 5354985 (1994-10-01), Quate
patent: 5360764 (1994-11-01), Celotta et al.
patent: 5607601 (1997-03-01), Loper et al.
patent: 5851725 (1998-12-01), McClelland
Physical Review B; Third Series, vol. 41 No. 6: pp. 3303-3315; Feb. 15, 1 "Theory of spin-polarized metastable-atom-deexcitation spectroscopy: NI-He"; D.R. Penn et al.
Science; vol.262; pp. 877-880; Nov. 5, 1993; "Laser-Focused Atomic Deposition"; J.J. McClelland et al.
J. Vac. Sci. Technol. B, vol. 13 No. 3; pp. 805-811 May/Jun. 1995; "Nanometer lithography on silicon and hydrogenated amorphous silicon with low energy electrons" N. Kramer et al.
Letters to Nature; Vo.l. 375-18; May, 1995; pp. 214-216; "Imaging with an atomic beam", W.G. Kaenders et al.
Science; vol. 268; Jun. 16, 1995; pp. 1590-1592; "Atomic-Scale Desorption Through Electronic and Vibrational Excitation Mechanisms", T.C. Shen et al.
Science; vol. 269; Sep. 1, 1995; pp. 1255-1257; "Microlithography by Neutral Metastable Atoms and Self-Assembled Monolayers", K.K. Berggren et al.
Experimental Methods in the Physical Sciences; vol. 29B; 1996; pp. 95-98; "Sources of Metastable Atoms and Molecules", T.J. Gay.
Optics Communications; Jan. 15, 1997; pp. 105-111; "A virtual amplitude grating for atomic optics", A.P. Chu et al.
Celotta Robert J.
Craighead Harold
Gupta Rajeev
McClelland Jabez J.
Duda Kathleen
The United States of America as represented by the Secretary of
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