Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Reexamination Certificate
2006-08-01
2006-08-01
McPherson, John A. (Department: 1756)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
C430S313000, C430S314000, C134S002000, C134S036000
Reexamination Certificate
active
07083897
ABSTRACT:
A new method is provided to create a polysilicon fuse. The invention provides for applying a first oxide plasma treatment to the surface of the created polysilicon fuse, creating a thin layer of native oxide over the surface of the created polysilicon fuse, followed by a DI water rinse. This thin layer of native oxide is made more robust by applying a second oxide plasma treatment to exposed surfaces, this more robust layer of native oxide protects the polysilicon fuse during subsequent processing steps of wet photoresist and polymer removal.
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Chen Fei-Yun
Hwang Yuan-Ko
Lee Yuan-Pang
Shieh Chen-Shiang
Yin Ping-Hung
Chacko-Davis Daborah
McPherson John A.
Taiwan Semiconductor Manufacturing Company
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