Method of fabricating a dynamic random access memory device

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate

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Details

438255, 438396, 438398, H01L 218242, H01L 21368

Patent

active

061469408

ABSTRACT:
A method of fabricating a dynamic random access memory is disclosed, which mainly utilizing selective liquid-phase deposition process to form an insulation layer on the gate electrode structure.

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patent: 5872041 (1999-02-01), Lee et al.

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