Method of exposing and developing a homopolymer resist

Details Method of exposing and developing a homopolymer resist Method of exposing and developing a homopolymer resist

1980-07-22

1981-08-25

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Electron beam imaging

430270, 430275, 430311, 430313, 427 35, 427 36, 430286, 430325, 20415916, G03C 500, G03C 171

Patent

active

042860504

ABSTRACT:
Homopolymers of 1-aza-5-acryloxymethyl-3,7-dioxabicyclo[3.3.0]octane are useful as resists for recording information patterns having high sensitivity and excellent contrast between exposed and unexposed areas.

REFERENCES:
patent: 3842051 (1974-10-01), Himics
patent: 3885964 (1975-05-01), Nacci
patent: 3951657 (1976-04-01), Recchia et al.
patent: 4079159 (1978-03-01), Sano et al.
patent: 4098984 (1978-07-01), Turner
patent: 4143225 (1979-03-01), Turner

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