Method of examining microcircuit patterns

Details Method of examining microcircuit patterns Method of examining microcircuit patterns

1983-10-13

1986-11-18

Rosenberger, R. A.

Optics: measuring and testing

By configuration comparison

With photosensitive film or plate

G01B 1100

Patent

active

046232559

ABSTRACT:
Examination of microstructures of LSI and VLSI devices is facilitated by employing a method in which the device is photographed through a darkfield illumination optical microscope and the resulting negative subjected to inverse processing to form a positive on a photographic film. The film is then developed to form photographic prints or transparencies which clearly illustrate the structure of the device. The entire structure of a device may be examined by alternately photographing the device and selectively etching layers of the device in order to expose underlying layers.

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