Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Patent
1991-09-18
1994-01-04
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
430166, 430192, 430313, 430325, 430326, 156628, 156643, 156646, G03F 736
Patent
active
052759202
ABSTRACT:
A finely structurable resist system for a dry development process is provided. A latent image is produced in a light-sensitive layer by imaging exposure and is intensified by treatment with, for example, an organosilicon compound. The etching resistance to an oxygen plasma is simultaneously increased. The light-sensitive layer preferably comprises anhydride or epoxy groups that are suitable for reaction with the functional groups of the organosilicon compounds. A silylizing treatment can be implemented with a solution or emulsion in a simple apparatus or can be implemented in the vapor phase.
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Ahne Hellmut
Birkle Siegfried
Leuschner Rainer
Sebald Michael
Sezi Recai
Bowers Jr. Charles L.
Siemens Aktiengesellschaft
Young Christopher G.
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