Method of drawing a pattern on a base material by scanning a...

Details Method of drawing a pattern on a base material by scanning a... Method of drawing a pattern on a base material by scanning a...

2006-02-21

2006-02-21

Chea, Thorl (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Electron beam imaging

C430S320000, C430S321000, C430S322000, C219S121120, C219S121190, C219S121200, C250S492220

Reexamination Certificate

active

07001709

ABSTRACT:
A method of drawing a pattern on a base material by scanning a beam, comprising: drawing a pattern including ring-shaped zones on a first pattern-drawn field on a base material by scanning a beam on a first pattern-drawn field; shifting at least one of the beam source and the base material to scan the beam on a second pattern-drawn field located next to the first pattern-drawn field in such a way that a boundary between the first pattern-drawn field and the second pattern-drawn field is positioned at a joint portion between a slope portion and a side wall portion of the ring-shaped zones; and drawing the pattern on the second pattern-drawn field by scanning a beam so that the joint portion between the slope portion and the side wall portion is drawn at the boundary between the first pattern-drawn field and the second pattern-drawn field.

REFERENCES:
patent: 5114513 (1992-05-01), Hosokawa et al.
patent: 2002/0170887 (2002-11-01), Furuta et al.
patent: 08-095231 (1996-04-01), None

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