Method of drawing a pattern by direct writing with charged parti

Details Method of drawing a pattern by direct writing with charged parti Method of drawing a pattern by direct writing with charged parti

1999-06-17

2000-09-05

Young, Christopher G.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Electron beam imaging

430942, G03F 720

Patent

active

061140937

ABSTRACT:
A pattern drawing method by directly writing a pattern with a charged particle electron beam, in which a resist containing metal powders is applied on a substrate having a substrate pattern formed thereon, so to form a resist film, and a desired pattern is written by exposing the resist film with a charged particle electron beam.

REFERENCES:
patent: 4612275 (1986-09-01), Gregor
patent: 5215867 (1993-06-01), Stillwagon et al.

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